Interface and Surface Science Laboratory

Lab Equipment

Major Systems Available in Our Lab

UHV System 1

UHV System 1

UHV-System 1

  • Auger Electron Spectroscopy (AES)
  • Low Energy Electron Diffraction (LEED)
  • Temperature Programmed Desorption (TPD)

UHV System 2

UHV System 2

UHV System 2

Low Energy Electron Diffraction

Low Energy Electron Diffraction (LEED)

(High Temperature) Scanning Tunneling Microscopy (STM)

UHV System 3

UHV System 3

UHV System 3

Laser Molecular Epitaxy

Laser molecular beam epitaxy

Reflection high energy electron diffraction

Reflection high energy electron diffraction (RHEED)

  • X-Ray photoemission spectroscopy (XPS)
  • X-ray photo electron diffraction (XPD)

UHV System 4

  • Room temperature scanning tunneling microscopy (STM)
  • Photoemission electron microscopy (PEEM)
  • X-ray photoemission spectroscopy (XPS) (in planning)
  • Preparation chamber with MBE and low energy electron diffraction (LEED) (in planning)

Non-Vacuum Systems

Dual-zone tube furnace for graphene and oxide nanomaterials synthesis

Atomic Force Microscope

Atomic Force Microscope

Photocatalyst testing station

Photocatalyst testing station 

(UV-Vis spectrometer and Hg-UV lamp for photocatalytic organic dye decompostion)